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High performance tunnel field effect transistors based on in-plane transition metal dichalcogenide heterojunctions

Choukroun J
•
Pala M
•
Fang S
altro
Dollfus P
2019
  • journal article

Periodico
NANOTECHNOLOGY
Abstract
In-plane heterojunction tunnel field effect transistors based on monolayer transition metal dichalcogenides are studied by means of self-consistent non-equilibrium Green’s functions simulations and an atomistic tight-binding Hamiltonian. We start by comparing several heterojunctions before focusing on the most promising ones, i.e. WTe 2 -MoS 2 and MoTe 2 -MoS 2 . The scalability of those devices as a function of channel length is studied, and the influence of backgate voltages on device performance is analyzed. Our results indicate that, by fine-tuning the design parameters, those devices can yield extremely low subthreshold swings (<5 mV/decade) and I ON / I OFF ratios higher than 10 8 at a supply voltage of 0.3 V, making them ideal for ultra-low power consumption.
WOS
WOS:000449171600001
Archivio
https://hdl.handle.net/11390/1266724
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-85056401017
http://stacks.iop.org/0957-4484/30/i=2/a=025201
https://ricerca.unityfvg.it/handle/11390/1266724
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