This work reports on the fabrication and characterization of a novel high-speed, low-noise X-ray Avalanche Photodiode based on III-V compound semiconductors operating over an extended photon energy range. These materials were suggested as their higher atomic numbers allow for the absorption of higher photon energies; hence, shorter response times can be achieved by growing APDs with thinner active regions. In addition, the use of staircase hetero-junctions enhances electron multiplication and results in lower noise if compared with conventional p-i-n diodes. In this work, molecular beam epitaxy was used to produce GaAs/AlGaAs APDs with separated absorption and multiplication regions. The multiplication region, separated from the absorption region by a δ p-doped layer of carbon, contains a staircase structure composed of nanometric layers of AlGaAs and GaAs, which alternate periodically. The periodic modulation of the band gap enables a well-defined charge multiplication and results in low multiplication noise. Several devices were characterized in terms of dark current, photocurrents generated utilizing visible and hard X-ray sources as well as noise generated under laser light.
