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Nonadiabatic surface reaction: Mechanism of electron emission in the Cs+O_{2} system

A. Böttcher
•
R. Imbeck
•
MORGANTE, ALBERTO
•
G. Ertl
1990
  • journal article

Periodico
PHYSICAL REVIEW LETTERS
Abstract
Electron emission during oxidation of thin Cs films is confined to the stage Cs2O2→CsO2 and is caused by Auger deexcitation accompanying the (formal) reaction O22-(s)+O2→2O2-(s). This nonadiabatic process becomes possible because resonance ionization of the affinity level of the impinging O2 molecule upon crossing the Fermi level EF is efficiently suppressed due to the absence of occupied states near EF at the surface.
DOI
10.1103/PhysRevLett.65.2035
WOS
WOS:A1990ED48100018
Archivio
http://hdl.handle.net/11368/2557015
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-8644275986
http://prl.aps.org/pdf/PRL/v65/i16/p2035_1
Diritti
metadata only access
Soggetti
  • oxidation

  • thin Cs film

  • exoelectron emission

  • nonadiabatic process

Web of Science© citazioni
86
Data di acquisizione
Mar 22, 2024
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