In this paper, a III-V nanowire TFET technology platform is compared against the predictive technology models of FinFETs at 10 nm node by evaluating the performance of two different comparator topologies. Furthermore, the potential of a hybrid FinFET/TFET approach in multi supply voltage design is addressed by considering level shifter circuits. Both analyses confirm that III-V TFET represents a promising technology option for future integrated circuits with sub-0.4 V operation.
