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Dissociative chemisorption of O2 inducing stress corrosion cracking in silicon crystals

Gleizer, Anna
•
Peralta, Giovanni
•
Kermode, James R.
altro
Sherman, Dov
2014
  • journal article

Periodico
PHYSICAL REVIEW LETTERS
Abstract
Fracture experiments to evaluate the cleavage energy of the (110) [110] and (111) [112] cleavage systems in silicon at room temperature and humidity give 2.7 +/- 0.3 and 2.2 +/- 0.2 J/m(2), respectively, lower than any previous measurement and inconsistent with density functional theory ( DFT) surface energy calculations of 3.46 and 2.88 J=m(2). However, in an inert gas environment, we measure values of 3.5 +/- 0.2 and 2.9 +/- 0.2 J=m(2), consistent with DFT, that suggest a previously undetected stress corrosion cracking scenario for Si crack initiation in room conditions. This is fully confirmed by hybrid quantum-mechanics molecular-mechanics calculations.
DOI
10.1103/PhysRevLett.112.115501
WOS
WOS:000332925900021
Archivio
http://hdl.handle.net/11368/2833503
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-84897877765
Diritti
metadata only access
Soggetti
  • SINGLE-CRYSTAL

  • SURFACE-ENERGY

  • DYNAMIC FRACTURE

  • SI

  • INSTABILITIES

  • ANISOTROPY

  • STRENGTH

  • GROWTH

Web of Science© citazioni
28
Data di acquisizione
Mar 22, 2024
Visualizzazioni
3
Data di acquisizione
Apr 19, 2024
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