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Dielectric constant boost in amorphous sesquioxides

DELUGAS, Pietro Davide
•
Fiorentini V
•
Filippetti A.
2008
  • journal article

Periodico
APPLIED PHYSICS LETTERS
Abstract
High-kappa dielectrics for insulating layers are a current key ingredient of microelectronics. X(2)O(3) sesquioxide compounds are among the candidates. Here, we show for a typical material of this class, Sc(2)O(3), that the relatively modest dielectric constant of its crystalline phase is enhanced in the amorphous phase by over 40% (from similar to 15 to similar to 22). This is due to the disorder-induced activation of low frequency cation-related modes which are inactive or inefficient in the crystal and by the conservation of effective dynamical charges (a measure of atomic polarizability). The analysis employs density-functional energy-force and perturbation-theory calculations of the dielectric response of amorphous samples generated by pair-potential molecular dynamics. (C) 2008 American Institute of Physics.
DOI
10.1063/1.2917797
WOS
WOS:000255524000046
Archivio
http://hdl.handle.net/20.500.11767/32374
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-43049091872
Diritti
metadata only access
Soggetti
  • Functional perturbati...

  • Settore FIS/03 - Fisi...

Scopus© citazioni
15
Data di acquisizione
Jun 2, 2022
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Web of Science© citazioni
13
Data di acquisizione
Mar 19, 2024
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Data di acquisizione
Apr 19, 2024
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