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Tunnelling Injection in Thin Oxide MOS Capacitors

. DALLA SERRA, A.
•
SANGIORGI, E.
•
ABRAMO, Antonio
altro
SELMI, Luca
2000
  • conference object

Abstract
In this paper the semi-classical and quantum-mechanical definitions of escape-time from quasi-bound states have been compared in the frame of MOSFET gate leakage-current calculations. The theoretical background and the numerical issues involved in the implementation of these approaches inside device simulators have been compared. Results on many different thin gate-oxide capacitors, and on a special purpose test structure with mercury-probe contact, point out that the semi-classical approach is faster, less demanding from the numerical point of view, and surprisingly accurate compared to the fully quantum-mechanical treatment of more physically-sound models.
Archivio
http://hdl.handle.net/11390/678043
Diritti
closed access
Visualizzazioni
3
Data di acquisizione
Apr 19, 2024
Vedi dettagli
google-scholar
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