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High spatial resolution STXM at 6.2 keV photon energy

Vila-Comamala J.
•
Dierolf M.
•
Kewish C. M.
altro
David C.
2010
  • conference object

Abstract
We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes. © 2010 American Institute of Physics.
DOI
10.1063/1.3399261
WOS
WOS:000278534600015
Archivio
http://hdl.handle.net/11368/2977436
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-77958017557
Diritti
metadata only access
Soggetti
  • Atomic layer depositi...

  • Electron-beam lithogr...

  • X-ray diffractive opt...

  • X-ray microscopy

Web of Science© citazioni
8
Data di acquisizione
Mar 14, 2024
Visualizzazioni
3
Data di acquisizione
Apr 19, 2024
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