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On the extraction of the channel current in permeable gate oxide MOSFETs

PALESTRI P
•
ESSENI D
•
GUEGAN G
2004
  • journal article

Periodico
SOLID-STATE ELECTRONICS
Abstract
It is a common practice to extract the channel current in permeable gate MOSFETs as the average of the source and drain currents. This paper analyzes the extraction error associated to this procedure by means of theoretical calculations, measurements in a nMOS technology with 1.5 nm oxide thickness and a simple distributed model of the permeable gate MOSFET. The main dependencies of the extraction error on the bias conditions, the oxide thickness and the channel length are discussed in detail.
DOI
10.1016/j.sse.2003.09.030
WOS
WOS:000220009700016
Archivio
http://hdl.handle.net/11390/877996
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-0442327510
Diritti
closed access
Soggetti
  • MOSFET

  • ultra-thin oxide

  • gate leakage

  • parameter extraction

  • mobility extraction

Scopus© citazioni
0
Data di acquisizione
Jun 14, 2022
Vedi dettagli
Web of Science© citazioni
0
Data di acquisizione
Mar 26, 2024
Visualizzazioni
4
Data di acquisizione
Apr 19, 2024
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