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A novel method to determine the Source and Drain resistances of individual MOSFETs

RICCO B
•
SELMI, Luca
•
SANGIORGI, Enrico
1988
  • conference object

Abstract
A novel method is presented to determine the bias-dependent series resistances and intrinsic conductance factor of individual MOSFETs. The parameter-extraction procedure can also be applied to groups of scaled transistors to work out the device effective channel length. The method is derived analytically from the conventional theory of ideal MOSFETs, and the deviations of real devices from such a case are studied using two-dimensional device simulations. Experimental results with n- and p-channel conventional and LDD (lightly doped drain) MOSFETs are presented to demonstrate the correctness of the method
DOI
10.1109/IEDM.1988.32768
Archivio
http://hdl.handle.net/11390/685964
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-0024170749
Diritti
closed access
Scopus© citazioni
3
Data di acquisizione
Jun 2, 2022
Vedi dettagli
Visualizzazioni
4
Data di acquisizione
Apr 19, 2024
Vedi dettagli
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