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Effect of the choice of the tunnelling path on semi-classical numerical simulations of TFET devices

DE MICHIELIS, Luca
•
IELLINA, Matteo
•
PALESTRI, Pierpaolo
altro
IONESCU A
2012
  • journal article

Periodico
SOLID-STATE ELECTRONICS
Abstract
In this work a non-local band-to-band tunnelling model has been successfully implemented into a fullband Monte Carlo simulator and applied to Tunnel-FET devices. No stability or statistical noise problems were encountered in spite of particle weights ranging over many orders of magnitude (due to vastly different generation rates at different positions inside the device and biases) so that Tunnel-FET I–V curves could be traced over the whole on–off range. Different approaches for the choice of the tunnelling path have been compared and relevant differences are observed in both the current levels and the spatial distribution of the generated carriers.
DOI
10.1016/j.sse.2011.10.012
WOS
WOS:000303033800003
Archivio
http://hdl.handle.net/11390/882564
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-84858703733
Diritti
closed access
Soggetti
  • Tunnel-FET

  • Band-to-band tunnelli...

  • Monte Carlo numerical...

  • Drift diffusion model...

Web of Science© citazioni
9
Data di acquisizione
Mar 28, 2024
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