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Simulation study of Fermi level depinning in metal-MoS2 contacts

Khakbaz P.
•
Driussi F.
•
Giannozzi P.
altro
Esseni D.
2021
  • journal article

Periodico
SOLID-STATE ELECTRONICS
Abstract
We used Density Functional Theory (DFT) to study the Fermi level pinning and Schottky barrier height in metal-MoS2 contacts. We showed that the Fermi level de-pinning could be attained by controlling the distance between the metal and MoS2. In particular, with proper buffer layers and the use of back-gated structures, the Schottky barrier height can be practically zeroed in some metal-MoS2 stacks, which is important to attain Ohmic contacts.
DOI
10.1016/j.sse.2021.108039
WOS
WOS:000687335000006
Archivio
http://hdl.handle.net/11390/1208660
info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-85108739226
Diritti
open access
Soggetti
  • 2-D material

  • Contact resistance

  • Fermi level de-pining...

  • Interface state

  • MoS2

Scopus© citazioni
2
Data di acquisizione
Jun 2, 2022
Vedi dettagli
Web of Science© citazioni
5
Data di acquisizione
Mar 18, 2024
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