A study of diffusive transport in 14nm FDSOI MOSFET: NEGF versus QDD

Mugny G

•

Pereira F

•

Rideau D

altro

Delerue C

2016

conference object

DOI

10.1109/ESSDERC.2016.7599676

WOS

WOS:000386655900102

Archivio

https://hdl.handle.net/11390/1266786

info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-84994472152

https://ricerca.unityfvg.it/handle/11390/1266786

Diritti

metadata only access