Home
Esportazione
Statistica
Opzioni
Visualizza tutti i metadati (visione tecnica)
Ab-Initio Transport Study of Source-to-Channel Resistance in Metal-MoS2 Top Contacts Including Image Force Barrier Lowering in a Heterogeneous Dielectric Environment
Pilotto, Alessandro
•
Lizzit, Daniel
•
Pala, Marco
•
Esseni, David
2025
conference object
DOI
10.1109/sispad66650.2025.11186017
Archivio
https://hdl.handle.net/11390/1317144
https://ieeexplore.ieee.org/document/11186017
https://ricerca.unityfvg.it/handle/11390/1317144
Diritti
metadata only access
google-scholar
Vedi dettagli